Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations

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Issue Date
2016
Authors
O’Mullane, Samuel
Keller, Nick
Diebold, Alain C.
Publisher
Journal of Micro/Nanolithography, MEMS and MOEMS
Keywords
rigorous coupled wave analysis , finite element method , simulation , ellipsometric measurement , near-field image , Mueller matrix , convergence , grating structure , copper , cross-grating structure , FEM accuracy
Abstract
Using rigorous coupled wave analysis (RCWA) and finite element method (FEM) simulations together, many interesting ellipsometric measurements can be investigated. This work specifically focuses on simulating copper grating structures that are plasmonically active. Looking at near-field images and Mueller matrix spectra, understanding of physical phenomena is possible. A general strategy for combatting convergence difficulties in RCWA simulations is proposed and applied. The example used is a copper cross-grating structure with known slow convergence. Baseline simulations on simple samples are provided for comparison and determination of FEM accuracy.
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