Optimization of the Growth of Graphene on Cu Foil Substrates by Chemical Vapor Deposition

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Authors
Laveti, Siddarth
Hotalen, Jodi
Ventrice, Carl A., Jr
Issue Date
2018-04-20
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Other
Language
en_US
Keywords
graphene films , chemical vapor deposition , Cu foil substrates
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Abstract
The most common method for producing large area graphene films is by performing chemical vapor deposition on Cu foil substrates. The reason for using Cu as a substrate is that it has a very low solubility for C at the temperature that the chemical vapor deposition is performed, which ensures a self-limited growth of a single monolayer of graphene. The goal of this research project is to determine the optimal procedure for producing graphene films with a low defect density on Cu foil substrates.
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Poster Presented at the 2018 SUNY Polytechnic Institute Student Project Showcase.
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