Abstract
The most common method for producing large area graphene films is by performing chemical vapor deposition on Cu foil substrates. The reason for using Cu as a substrate is that it has a very low solubility for C at the temperature that the chemical vapor deposition is performed, which ensures a self-limited growth of a single monolayer of graphene. The goal of this research project is to determine the optimal procedure for producing graphene films with a low defect density on Cu foil substrates.
Description
Poster Presented at the 2018 SUNY Polytechnic Institute Student Project Showcase.