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    Optimization of the Growth of Graphene on Cu Foil Substrates by Chemical Vapor Deposition

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    Date
    2018-04-20
    Author
    Laveti, Siddarth
    Hotalen, Jodi
    Ventrice, Carl A., Jr
    Metadata
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    Subject
    graphene films
    chemical vapor deposition
    Cu foil substrates
    Abstract
    The most common method for producing large area graphene films is by performing chemical vapor deposition on Cu foil substrates. The reason for using Cu as a substrate is that it has a very low solubility for C at the temperature that the chemical vapor deposition is performed, which ensures a self-limited growth of a single monolayer of graphene. The goal of this research project is to determine the optimal procedure for producing graphene films with a low defect density on Cu foil substrates.
    Description
    Poster Presented at the 2018 SUNY Polytechnic Institute Student Project Showcase.
    URI
    http://hdl.handle.net/1951/70199
    Collections
    • 2018 Student Project Showcase [12]

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