Electronic structure, excitation properties, and chemical transformations of extreme ultra-violet resist materials
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Issue Date
2017-07-12
Authors
Rangan, Sylvie
Bartynski, Robert
Narasimhan, Amrit
Brainard, Robert
Publisher
American Institute of Physics
Keywords
extreme ultra-violet resist materials , photoacid generators , ab-initio techniques , electron energy loss spectroscopy , polymers , thin films , UV photoemission spectroscopies , X-ray effects
Abstract
The electronic structure of extreme ultra violet resist materials and of their individual components, two polymers and two photoacid generators (PAGs), is studied using a combination of x-ray and UV photoemission spectroscopies, electron energy loss spectroscopy, and ab-initio techniques. It is shown that simple molecular models can be used to understand the electronic structure of each sample and describe the experimental data. Additionally, effects directly relevant to the photochemical processes are observed: low energy loss processes are observed for the phenolic polymer containing samples that should favor thermalization of electrons; PAG segregation is measured at the surface of the resist films that could lead to surface inhomogeneities; both PAGs are found to be stable upon irradiation in the absence of the polymer, contrasting with a high reactivity that can be followed upon x-ray irradiation of the full resist.