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dc.contributor.authorRangan, Sylvie
dc.contributor.authorBartynski, Robert
dc.contributor.authorNarasimhan, Amrit
dc.contributor.authorBrainard, Robert
dc.creator
dc.date.accessioned2017-08-01T16:57:00Z
dc.date.available2017-08-01T16:57:00Z
dc.date.issued2017-07-12
dc.identifier.citationRangan, S., Bartynski, R. A., Narasimhan, A., & Brainard, R. L. (2017). Electronic structure, excitation properties, and chemical transformations of extreme ultra-violet resist materials. Journal of Applied Physics, 122(2), 025305. doi:10.1063/1.4992083en_US
dc.identifier.issn1089-7550
dc.identifier.issn021-8979
dc.identifier.otherhttp://dx.doi.org/10.1063/1.4992083
dc.identifier.urihttp://hdl.handle.net/1951/69339
dc.description.abstractThe electronic structure of extreme ultra violet resist materials and of their individual components, two polymers and two photoacid generators (PAGs), is studied using a combination of x-ray and UV photoemission spectroscopies, electron energy loss spectroscopy, and ab-initio techniques. It is shown that simple molecular models can be used to understand the electronic structure of each sample and describe the experimental data. Additionally, effects directly relevant to the photochemical processes are observed: low energy loss processes are observed for the phenolic polymer containing samples that should favor thermalization of electrons; PAG segregation is measured at the surface of the resist films that could lead to surface inhomogeneities; both PAGs are found to be stable upon irradiation in the absence of the polymer, contrasting with a high reactivity that can be followed upon x-ray irradiation of the full resist.en_US
dc.publisherAmerican Institute of Physicsen_US
dc.subjectextreme ultra-violet resist materialsen_US
dc.subjectphotoacid generatorsen_US
dc.subjectab-initio techniquesen_US
dc.subjectelectron energy loss spectroscopyen_US
dc.subjectpolymersen_US
dc.subjectthin filmsen_US
dc.subjectUV photoemission spectroscopiesen_US
dc.subjectX-ray effectsen_US
dc.titleElectronic structure, excitation properties, and chemical transformations of extreme ultra-violet resist materialsen_US
dc.typeArticleen_US


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