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dc.contributor.authorDixit, Dhairya J.
dc.contributor.authorKamineni, Vimal
dc.contributor.authorFarrell, Richard
dc.contributor.authorHosler, Erik R.
dc.contributor.authorPreil, Moshe
dc.contributor.authorRace, Joseph
dc.contributor.authorPeterson, Brennan
dc.contributor.authorDiebold, Alain C.
dc.creator
dc.date.accessioned2017-05-12T13:56:46Z
dc.date.available2017-05-12T13:56:46Z
dc.date.issued2015
dc.identifier.citationDixit, D. J., Kamineni, V., Farrell, R., Hosler, E. R., Preil, M., Race, J., … Diebold, A. C. (2015). Metrology for block copolymer directed self-assembly structures using Mueller matrixbased scatterometry. Journal of Micro/Nanolithography, MEMS, and MOEMS, 14(2), 021102. doi:10.1117/1.JMM.14.2.021102en_US
dc.identifier.issn1932-5150
dc.identifier.urihttp://hdl.handle.net/1951/69189
dc.description.abstractPatterning based on directed self-assembly (DSA) of block copolymer (BCP) has been demonstrated to be a cost-effective manufacturing technique for advanced sub-20-nm structures. This paper describes the application of Mueller matrix spectroscopic ellipsometry (MMSE) based scatterometry to optically characterize polystyrene-b-polymethylmethacrylate patterns and Si fins fabricated with DSA. A regression-based (inverse problem) approach is used to calculate the line-width, line-shape, sidewall-angle, and thickness of the DSA structures. In addition, anisotropy and depolarization calculations are used to determine the sensitivity of MMSE to DSA pattern defectivity. As pattern order decreases, the mean squared error value increases, depolarization value increases, and anisotropy value decreases. These specific trends are used in the current work as a method to judge the degree of alignment of the DSA patterns across the wafer.en_US
dc.description.sponsorshipCollege of Nanoscale Science & Engineering, 257 Fuller Road, Albany, New York 12203, United States GLOBALFOUNDRIES U.S. Inc., 255 Fuller Road, Suite 280, Albany, New York 12203, United States GLOBALFOUNDRIES U.S. Inc., 1050 Arques Avenue, Sunnyvale, California 94085, United States Nanometrics, 1550 Buckeye Drive, Milpitas, California 95035, United Statesen_US
dc.language.isoen_USen_US
dc.publisherJournal of Micro/Nanolithography, MEMS, and MOEMSen_US
dc.subjectpatterningen_US
dc.subjectdirected self-assemblyen_US
dc.subjectnano manufacturingen_US
dc.subjectMueller matrix spectroscopic ellipsometryen_US
dc.subjectscatterometryen_US
dc.subjectanisotropyen_US
dc.subjectdepolarization calculationen_US
dc.titleMetrology for block copolymer directed self-assembly structures using Mueller matrixbased scatterometryen_US
dc.title.alternativeJournal of Micro/Nanolithography, MEMS, and MOEMSen_US
dc.typeArticleen_US


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