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    Metrology for block copolymer directed self-assembly structures using Mueller matrixbased scatterometry

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    Metrology for block copolymer directed self-assembly structures using Mueller matrix-based scatterometry_Final.pdf (3.886Mb)
    Date
    2015
    Author
    Dixit, Dhairya J.
    Kamineni, Vimal
    Farrell, Richard
    Hosler, Erik R.
    Preil, Moshe
    Race, Joseph
    Peterson, Brennan
    Diebold, Alain C.
    Publisher
    Journal of Micro/Nanolithography, MEMS, and MOEMS
    Metadata
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    Subject
    patterning
    directed self-assembly
    nano manufacturing
    Mueller matrix spectroscopic ellipsometry
    scatterometry
    anisotropy
    depolarization calculation
    Abstract
    Patterning based on directed self-assembly (DSA) of block copolymer (BCP) has been demonstrated to be a cost-effective manufacturing technique for advanced sub-20-nm structures. This paper describes the application of Mueller matrix spectroscopic ellipsometry (MMSE) based scatterometry to optically characterize polystyrene-b-polymethylmethacrylate patterns and Si fins fabricated with DSA. A regression-based (inverse problem) approach is used to calculate the line-width, line-shape, sidewall-angle, and thickness of the DSA structures. In addition, anisotropy and depolarization calculations are used to determine the sensitivity of MMSE to DSA pattern defectivity. As pattern order decreases, the mean squared error value increases, depolarization value increases, and anisotropy value decreases. These specific trends are used in the current work as a method to judge the degree of alignment of the DSA patterns across the wafer.
    URI
    http://hdl.handle.net/1951/69189
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    • SUNY Polytechnic Institute Faculty and Staff Research, Publications, and Creative Works [63]

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