Metrology for block copolymer directed self-assembly structures using Mueller matrixbased scatterometry

Date
2015Author
Dixit, Dhairya J.Kamineni, Vimal
Farrell, Richard
Hosler, Erik R.
Preil, Moshe
Race, Joseph
Peterson, Brennan
Diebold, Alain C.
Publisher
Journal of Micro/Nanolithography, MEMS, and MOEMSMetadata
Show full item recordSubject
patterningdirected self-assembly
nano manufacturing
Mueller matrix spectroscopic ellipsometry
scatterometry
anisotropy
depolarization calculation