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dc.contributor.authorO’Mullane, Samuel
dc.contributor.authorKeller, Nick
dc.contributor.authorDiebold, Alain C.
dc.creator
dc.date.accessioned2017-04-12T13:37:41Z
dc.date.available2017-04-12T13:37:41Z
dc.date.issued2016
dc.identifier.issn1932-5150
dc.identifier.urihttp://hdl.handle.net/1951/69068
dc.description.abstractUsing rigorous coupled wave analysis (RCWA) and finite element method (FEM) simulations together, many interesting ellipsometric measurements can be investigated. This work specifically focuses on simulating copper grating structures that are plasmonically active. Looking at near-field images and Mueller matrix spectra, understanding of physical phenomena is possible. A general strategy for combatting convergence difficulties in RCWA simulations is proposed and applied. The example used is a copper cross-grating structure with known slow convergence. Baseline simulations on simple samples are provided for comparison and determination of FEM accuracy.en_US
dc.description.sponsorshipSUNY Polytechnic Institute, College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States Nanometrics, Inc., 1550 Buckeye Drive, Milpitas, California 95035, United Statesen_US
dc.language.isoen_USen_US
dc.publisherJournal of Micro/Nanolithography, MEMS and MOEMSen_US
dc.subjectrigorous coupled wave analysisen_US
dc.subjectfinite element methoden_US
dc.subjectsimulationen_US
dc.subjectellipsometric measurementen_US
dc.subjectnear-field imageen_US
dc.subjectMueller matrixen_US
dc.subjectconvergenceen_US
dc.subjectgrating structureen_US
dc.subjectcopperen_US
dc.subjectcross-grating structureen_US
dc.subjectFEM accuracyen_US
dc.titleModeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulationsen_US
dc.title.alternativeJournal of Micro/Nanolithography, MEMS and MOEMSen_US
dc.typeArticleen_US


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