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    Platinum and palladium oxalates: positive-tone extreme ultraviolet resists

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    Date
    2015-12-24
    Author
    Sortland, Miriam
    Hotalen, Jodi
    Del Re, Ryan
    Passarelli, James
    Murphy, Michael
    Kulmala, Tero
    Ekinci, Yasin
    Neisser, Mark
    Freedman, Daniel
    Brainard, Robert
    Publisher
    Society of Photo-Optical Instrumentation Engineers (SPIE)
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    Subject
    palladium oxalates
    platinum oxalates
    positive-tone extreme ultraviolet resists
    palladium mononuclear complexes
    platinum mononuclear complexes
    EUV photosensitivity
    lithographic performance
    photoreaction
    metal carbonates
    Abstract
    Here, we present platinum and palladium mononuclear complexes with EUV photosensitivity and lithographic performance. Many platinum and palladium complexes show little or no EUV sensitivity; however, we have found that metal carbonates and metal oxalates (L2M(CO3) and L2M(C2O4); M = Pt or Pd) are sensitive to EUV. The metal carbonates give negative-tone behavior. The most interesting result is that the metal oxalates give the first positive-tone EUV resists based on mononuclear organometallic compounds. In particular, (dppm)Pd(C2O4) (dppm = 1,1-bis(diphenylphosphino)methane) (23) prints 30-nm dense lines with Esize of 50 mJ/cm2. Derivatives of (23) were synthesized to explore the relationship between the core metal and the resist sensitivity. The study showed that palladium-based resists are more sensitive than platinum-based resists. The photoreaction has been investigated for two of our most promising resists, (dppm)Pd(C2O4) (23) and (Ph2EtP)2PdC2O4 (27). Our experiments suggest the loss of CO2 and the formation of a zerovalent L4Pd complex upon exposure to light. We have identified dppm2Pd(δ(P)23:6) as the main photoproduct for (23) and (Ph2EtP)4Pd (δ(P)32:7) as the main photoproduct for (27).
    URI
    http://hdl.handle.net/1951/68699
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    • SUNY Polytechnic Institute Faculty and Staff Research, Publications, and Creative Works [63]

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