Browsing SUNY Polytechnic Institute Faculty and Staff Research, Publications, and Creative Works by Subject "annealing temperature"
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Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications
(Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2017)Resistance capacitance time delay in Cu interconnects is becoming a significant factor requiring further performance improvements in future nanoelectronic devices. Choice of alternate interconnect materials, for example, ...