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    • Rapid trench initiated recrystallization and stagnation in narrow Cu interconnect lines 

      O'Brien, Brendan; Rizzolo, Michael; Prestowitz, Luke; Dunn, Kathleen (American Institute of Physics, 2015-09-01)
      Understanding and ultimately controlling the self-annealing of Cu in narrow interconnect lines has remained a top priority in order to continue down-scaling of back-end of the line interconnects. Recently, it was hypothesized ...