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    • Neutral Atom Lithography Using the 389 nm Transition in Metastable Helium 

      Reeves, Jason R. (The Graduate School, Stony Brook University: Stony Brook, NY., 1-Aug-10)
      Resist based neutral atom lithography with metastable 2<super>3</super>S<sub>1</sub> helium(He. ) has been used to produce small structures in both goldand palladium. A beam of He. from a reverse flow, DC dischargesource ...