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    • Metrology for block copolymer directed self-assembly structures using Mueller matrixbased scatterometry 

      Dixit, Dhairya J.; Kamineni, Vimal; Farrell, Richard; Hosler, Erik R.; Preil, Moshe; Race, Joseph; Peterson, Brennan; Diebold, Alain C. (Journal of Micro/Nanolithography, MEMS, and MOEMS, 2015)
      Patterning based on directed self-assembly (DSA) of block copolymer (BCP) has been demonstrated to be a cost-effective manufacturing technique for advanced sub-20-nm structures. This paper describes the application of ...