Browsing by Author "Basavalingappa, Adarsh"
Now showing items 1-3 of 3
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Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects
(Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2016)The availability of defect-free masks is considered to be a critical issue for enabling extreme ultraviolet lithography (EUVL) as the next generation technology. Since completely defect-free masks will be hard to achieve, ... -
Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects
(American Vacuum Society, 2015-02-01)The availability of defect-free masks is considered to be a critical issue for enabling extreme ultraviolet lithography (EUVL) as the next generation technology. Since completely defect-free masks will be hard to achieve, ... -
Modeling the copper microstructure and elastic anisotropy and studying its impact on reliability in nanoscale interconnects
(Mechanics of Advanced Materials and Modern Processes, 2017)Copper is the primary metal used in integrated circuit manufacturing of today. Even though copper is face centered cubic it has significant mechanical anisotropy depending on the crystallographic orientations. Copper metal ...
